发明名称 SUBSTRATE-TREATING DEVICE
摘要 PROBLEM TO BE SOLVED: To continue normal application treatment of ultraviolet rays even if an ultraviolet lamp causes emission failure or the like. SOLUTION: An ultraviolet application unit (UV) is provided with the same number of photosensors 72(1)-72(n) for individually monitoring the emission state of a plurality of (n) ultraviolet lamps 64(1)-64(n) in a lamp chamber 66. A stage 76 for that can be moved horizontally or elevated to support a substrate G by placing it is provided in a washing treatment chamber 68 that is adjacent below the lamp chamber 66. When, for example, the lamp 64(1) out of the plurality of ultraviolet lamps 64(1)-64(n) causes emission failure, the use of the lighting of the failed lamp 64(1) is stopped. Then, a scanning speed (stage traveling speed in a Y direction) in the ultraviolet application treatment is corrected to a slower speed by a specific ratio as compared with a reference speed when all lamps are normal so that the amount of irradiation with ultraviolet rays by the remaining ultraviolet lamps 64(2)-64(n) in normal state does not become lower than a specific lower-limit value for assuring treatment quality to the substrate G on the stage 6.
申请公布号 JP2001332488(A) 申请公布日期 2001.11.30
申请号 JP20000155212 申请日期 2000.05.25
申请人 TOKYO ELECTRON LTD 发明人 OTA YOSHIHARU
分类号 H01L21/027;G03F7/20;H01L21/304;(IPC1-7):H01L21/027 主分类号 H01L21/027
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