发明名称 NON-VOLATILE SEMICONDUCTOR MEMORY
摘要 <p>PROBLEM TO BE SOLVED: To prevent reduction in a write-in prohibition potential caused by leak. SOLUTION: A drain side select-gate line SGD is set to VSG1 (>VDD) which can sufficiently transfer VDD (time t1). At this time, as all word lines in a selection block are Vread, VDD is transferred to channels of all memory cells in a cell unit. After that, the drain side select-gate line SGD is set to VSG2, and a write-in potential Vpgm is applied to a selection word line (time t2-t3). As VSG is sufficiently small, drain side select-gate transistors are all in an off-state, and channels of memory cells in all cell units are boosted. After that, the drain side select-gate line SGD is set to VSG3, 0 V is transferred to only a channel of a selection memory cell (time t4).</p>
申请公布号 JP2001332093(A) 申请公布日期 2001.11.30
申请号 JP20000150256 申请日期 2000.05.22
申请人 TOSHIBA CORP 发明人 KANDA KAZUE;HOSONO KOJI;IKEHASHI TAMIO;NAKAMURA HIROSHI;IMAMIYA KENICHI
分类号 G11C16/02;G11C16/04;G11C16/10;(IPC1-7):G11C16/02 主分类号 G11C16/02
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