发明名称 PATTERN TREATMENT METHOD
摘要 PROBLEM TO BE SOLVED: To provide a pattern treatment method that can improve edge roughness without generating any pattern deformation or the like. SOLUTION: In this pattern treatment method of a resist pattern 2 that is formed via exposure and development processes or a material pattern consisting of a resin pattern that is formed with the resist pattern as a mold, the surface region of the material pattern is selectively heated by casting light for allowing the surface region to selectively reflow.
申请公布号 JP2001332484(A) 申请公布日期 2001.11.30
申请号 JP20000153385 申请日期 2000.05.24
申请人 TOSHIBA CORP 发明人 KAWAMURA DAISUKE;SHIOBARA HIDESHI;ONISHI KIYONOBU;OKUMURA KATSUYA
分类号 G03F7/40;H01L21/027;(IPC1-7):H01L21/027 主分类号 G03F7/40
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