| 摘要 |
PROBLEM TO BE SOLVED: To provide a photosensitive material, a photosensitive liquid and a photosensitive element for the formation of a reflection layer having a rugged pattern which have high sensitivity and excellent adhesiveness to a substrate and which can be stably stored, and to provide a reflection layer for a reflection type LCD by using the above materials. SOLUTION: The photosensitive material, photosensitive liquid or photosensitive element for the formation of a reflection layer having a rugged pattern contain (a) a non-photosensitive polymer and (b) a photo setting composition. In the method for manufacturing a reflection layer for a reflection type LCD, the reflection layer for a reflection type LCD is obtained by using the above material, liquid or element to form a film on a substrate, imagewirely irradiating the film with active rays, photosetting the exposed part, and removing the unexposed part by development, and sputtering metal such as aluminum. |
