| 摘要 |
PROBLEM TO BE SOLVED: To provide a pattern data generation method capable generating pattern data for a 2nd exposure method having an overlapped part with pattern data for a 1st exposure method from design pattern data, without deteriorating the dimension of the pattern even for a very fine pattern, and also to provide a pattern data generation method capable of dealing with a flag type pattern. SOLUTION: The pattern data for the 2nd exposure method having no overlap margin is moved without being thinned, or to be thickened to add a part to be overlapped on the pattern data for the 1st exposure method as an overlap margin. In order to take measures to deal with the flag type pattern, not only the overlap tab which is vertical to a boundary, but also, an overlap tab which is parallel to the boundary is added to the pattern data for the 2nd exposure method. |
