SINGLE-WAFER PROCESSING APPARATUS

摘要

PROBLEM TO BE SOLVED: To provide a single-wafer processing apparatus which allows static electricity charged on a mount to be removed by a simple structure and is superior in maintainability and cost. SOLUTION: In the single-wafer processing apparatus, having an electrically insulative mount 3 for mounting a work w in a process chamber 2, the mount 3 has a conductive film 10 on the surface for relieving charged static electricity.