发明名称 ULTRAVIOLET RAY IRRADIATION EQUIPMENT
摘要 <p>PROBLEM TO BE SOLVED: To realize ultraviolet ray irradiation equipment wherein irradiation illuminance can be maintained at a constant level and deterioration of quality and yield of a color filter film and a microlens film which are to be caused by shortage of illuminance can be prevented. SOLUTION: This ultraviolet ray irradiation equipment is provided with a UV lamp 13 which irradiates a resin film arranged on a wafer 15 with ultraviolet ray, a variable voltage power source 17 for supplying a power to the UV lamp 13, and a wafer stage 16 having mechanism for raising and reducing a temperature which holds the wafer. An illuminance monitor 19 for detecting illuminance of irradiation on the wafer 15 and a controller 18 for controlling a power source voltage which is supplied from the variable voltage power source 17 in accordance with the illuminance detected by the illuminance monitor 19 are installed. The controller 18 operates so as to keep illuminance of irradiation from the UV lamp 13 to the wafer 15 at a constant value by controlling a power source voltage.</p>
申请公布号 JP2001332712(A) 申请公布日期 2001.11.30
申请号 JP20000148248 申请日期 2000.05.19
申请人 SONY CORP 发明人 HIROYA YOICHI
分类号 G21K5/00;G02B3/00;G02B5/20;H01L27/14;(IPC1-7):H01L27/14 主分类号 G21K5/00
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