APPARATUS FOR HEATING WAFER AND SOAKING PLATE

摘要

PROBLEM TO BE SOLVED: To provide an apparatus for heating a substrate with more uniform temperature distribution through a simple arrangement. SOLUTION: An apparatus for heating a substrate 1 in a vacuum container 5 comprises a soaking plate 8 having a substantially uniform temperature distribution on the surface upon heating, and means 10 for holding the substrate oppositely to the surface through a specified distance.