发明名称 Method of manufacturing film structure, method of manufacturing optical waveguide substrate and method of manufacturing second harmonic generation device
摘要 A film made of a single crystal of potassium lithium niobate is formed on a substrate made of a single crystal of potassium lithium niobate-potassium lithium tantalate solid solution. In this film formation, a temperature of the substrate is maintained in a range of 700° C.-850° C. and the film is formed by a metalorganic chemical vapor deposition method. By utilizing the film structure mentioned above, it is possible to generate a second harmonic wave in the optical waveguide with high efficiency.
申请公布号 US2001046552(A1) 申请公布日期 2001.11.29
申请号 US20010817405 申请日期 2001.03.26
申请人 NGK INSULATORS, LTD. 发明人 IWAI MAKOTO;OHMORI MAKOTO;YOSHINO TAKASHI
分类号 C30B25/02;(IPC1-7):B05D5/12;C23C16/00;B05D3/02 主分类号 C30B25/02
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