发明名称 |
Hierarchical process monitoring system identifies whether significant change of process conditions occurs as a result change in characteristics of certain self-inspecting sensor |
摘要 |
A process monitoring unit (14) and sensors (SEVA 1-36) having self-inspection capability, are provided in the higher and lower levels of the monitoring system. The monitoring unit monitors output signals of the sensors and identifies every significant change of the process conditions, and determines whether the change occurs as a result of the change in characteristics of a certain sensor or due to actual change in process conditions. An Independent claim is also included for process monitoring unit.
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申请公布号 |
DE10114206(A1) |
申请公布日期 |
2001.11.29 |
申请号 |
DE2001114206 |
申请日期 |
2001.03.23 |
申请人 |
SIMSCI LTD. INVENSYS HOUSE, LONDON |
发明人 |
HENRY, MANUS PATRICK;SANDOZ, DAVID JAMES;CLARKE, DAVID WILLIAM |
分类号 |
G01D3/08;G05B9/03;G05B23/02;(IPC1-7):G05B23/00;G01D21/00;G05B17/00 |
主分类号 |
G01D3/08 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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