Vorrichtung und Verfahren zur Belichtung

摘要

An exposure apparatus and method wherein a mask (100) is illuminated with light and one of light transmitted through and light reflected from the illuminated mask is imaged onto a substrate. At least during imaging, transmission of this light from the illuminated mask is partially inhibited. More particularly, a spatial filter (3302) is utilized for inhibiting at least a portion of 0-order diffraction light.