发明名称 |
COMPOSITION AND METHOD FOR RENDERING HALOGEN-CONTAINING GAS HARMLESS |
摘要 |
The present invention intends to provide an agent and a method for removing harmful gas, which exhibits high harm-removing ability per unit volume for harmful halogen-containing gas such as that contained in the exhaust gas from the etching or cleaning step in the manufacturing process of a semiconductor device, and which is inexpensive.The invention is characterized in that halogen-containing gas is removed using a harm-removing agent comprising iron oxide, an alkaline earth metal compound and activated carbon. In the case where the exhaust gas contains halogen gas such as chlorine or a gas such as sulfur dioxide, the gas is rendered harmless by additionally using a harm removing agent comprising activated carbon or zeolite.
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申请公布号 |
WO0189666(A1) |
申请公布日期 |
2001.11.29 |
申请号 |
WO2001JP04364 |
申请日期 |
2001.05.24 |
申请人 |
SHOWA DENKO K.K.;HAYASAKA, YUJI;ATOBE, HITOSHI;FURUSE, YOSHIO |
发明人 |
HAYASAKA, YUJI;ATOBE, HITOSHI;FURUSE, YOSHIO |
分类号 |
B01D53/04;B01D53/68;B01D53/86;B01J21/18;B01J23/78;(IPC1-7):B01D53/34;A62D3/00 |
主分类号 |
B01D53/04 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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