发明名称 Method for the calculation of wafer probe yield limits from in-line defect monitor data
摘要 A method of calculating yield limits for a factory to process semiconductor wafers, including the steps of generating a wafer map from the semiconductor wafers, eliminating die on said wafer map from consideration that have multiple defects, calculating killer probability for each of said die having only one defect, and predicting yield limits from said killer probabilities.
申请公布号 US6324481(B1) 申请公布日期 2001.11.27
申请号 US19990333713 申请日期 1999.06.15
申请人 TEXAS INSTRUMENTS INCORPORATED 发明人 ATCHISON NICK;ROSS RON
分类号 G01N33/00;H01L21/66;(IPC1-7):G01N37/00;G06F19/00 主分类号 G01N33/00
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