发明名称 SILICONE-CONTAINING COMPOSITION AND FILM-FORMING COMPOSITION
摘要 PROBLEM TO BE SOLVED: To produce a silicone-containing composition that forms a coating film excellent in surface hardness after PCT(Pressure Cooker Test), mechanical strength after PCT and adhesion to a substrate after PCT as a material for forming a surface protective film for plastics, glass, metal, ceramic or the like and as a material for forming an interlaminar insulating film in a semiconductor element or the like. SOLUTION: The silicone-containing composition comprises both of (A) a compound represented by the following formula (1) and its hydrolyzed condensate or either one thereof: R1a(R2O)3-aSiC≡CSi(OR3)3-bR4b (1), (wherein R1 and R4, which are the same or different, each denote a hydrogen atom, a fluorine atom or a monovalent organic group; R2 and R3 each denote a monovalent organic group; and a and b, which are the same or different, each denote an integer of 0 to 2).
申请公布号 JP2001329218(A) 申请公布日期 2001.11.27
申请号 JP20000150361 申请日期 2000.05.22
申请人 JSR CORP 发明人 YAMADA KINJI;NISHIKAWA MICHINORI
分类号 C08G77/50;C09D183/02;C09D183/04;C09D183/14;(IPC1-7):C09D183/14 主分类号 C08G77/50
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