发明名称 METHOD FORM FORMING LAMINATED FILM AND LAMINATED FILM
摘要 PROBLEM TO BE SOLVED: To form a laminated film of low resistance excellent in electrical conductivity and useful as a transparent electrically conductive thin film and a heat ray reflection film arranged in front of PDP by alternately laminating metallic oxide thin films and metallic thin films on a substrate into a multilayer by a sputtering method. SOLUTION: As to the method for forming a laminated film in which metallic oxide thin films and metallic thin films are deposited on a substrate in a laminated manner by a sputtering method, the concentration of oxygen in an atmospheric gas at the time of depositing the metallic oxide thin films is controlled to 5 to 15 vol%.
申请公布号 JP2001329363(A) 申请公布日期 2001.11.27
申请号 JP20000146891 申请日期 2000.05.18
申请人 BRIDGESTONE CORP 发明人 IWABUCHI YOSHINORI;KUSANO YUKIHIRO;YOSHIKAWA MASAHITO
分类号 B32B9/00;C23C14/06;C23C14/08;C23C14/34;H01B5/14;H01B13/00;(IPC1-7):C23C14/34 主分类号 B32B9/00
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