发明名称 |
METHOD FORM FORMING LAMINATED FILM AND LAMINATED FILM |
摘要 |
PROBLEM TO BE SOLVED: To form a laminated film of low resistance excellent in electrical conductivity and useful as a transparent electrically conductive thin film and a heat ray reflection film arranged in front of PDP by alternately laminating metallic oxide thin films and metallic thin films on a substrate into a multilayer by a sputtering method. SOLUTION: As to the method for forming a laminated film in which metallic oxide thin films and metallic thin films are deposited on a substrate in a laminated manner by a sputtering method, the concentration of oxygen in an atmospheric gas at the time of depositing the metallic oxide thin films is controlled to 5 to 15 vol%.
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申请公布号 |
JP2001329363(A) |
申请公布日期 |
2001.11.27 |
申请号 |
JP20000146891 |
申请日期 |
2000.05.18 |
申请人 |
BRIDGESTONE CORP |
发明人 |
IWABUCHI YOSHINORI;KUSANO YUKIHIRO;YOSHIKAWA MASAHITO |
分类号 |
B32B9/00;C23C14/06;C23C14/08;C23C14/34;H01B5/14;H01B13/00;(IPC1-7):C23C14/34 |
主分类号 |
B32B9/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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