发明名称 |
Preweakened on chip metal fuse using dielectric trenches for barrier layer isolation |
摘要 |
A fuse for use in an integrated circuit includes a dielectric layer into which a trench or void is etched defined by a top opening and a bottom floor. The trench includes at least one undercut which forms an overhang in the dielectric layer partially shielding the bottom floor. A second or barrier layer deposited onto the dielectric layer is interrupted or non-continuous at the undercut. A third, or electrically conductive layer, is electrically continuous over the fuse. A weak spot in the third layer exists in the lack of structural support by the second layer at the interruption. A further weak spot in the third layer exists in the electrical isolation of the conductor layer, i.e. no leakage current through the barrier layer, at the interruption.
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申请公布号 |
US6323111(B1) |
申请公布日期 |
2001.11.27 |
申请号 |
US19990428689 |
申请日期 |
1999.10.28 |
申请人 |
AGERE SYSTEMS GUARDIAN CORP |
发明人 |
HUI FRANK Y.;HARRIS EDWARD B. |
分类号 |
H01L23/525;(IPC1-7):H01L21/326 |
主分类号 |
H01L23/525 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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