发明名称 |
Method and apparatus for controlling the volume of a plasma |
摘要 |
A plasma confinement arrangement for controlling the volume of a plasma while processing a substrate inside a process chamber using a plasma enhanced process is disclosed. The arrangement includes a first magnetic bucket having a plurality of first magnetic elements. The first magnetic elements being configured for producing a first magnetic field inside the process chamber. The arrangement further includes a second magnetic bucket having a plurality of second magnetic elements. The second magnetic elements being configured for producing a second magnetic field inside the process chamber. The second magnetic field being configured to combine with the first magnetic field to produce a resultant magnetic field between the first magnetic bucket and the second magnetic bucket. The resultant magnetic field being configured to permit by-product gas from the processing to pass through while substantially confining the plasma within a volume defined at least by the process chamber and the resultant magnetic field.
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申请公布号 |
US6322661(B1) |
申请公布日期 |
2001.11.27 |
申请号 |
US19990439759 |
申请日期 |
1999.11.15 |
申请人 |
LAM RESEARCH CORPORATION |
发明人 |
BAILEY, III ANDREW D.;SCHOEPP ALAN M.;BRIGHT NICOLAS |
分类号 |
H05H1/46;C23C16/507;H01J37/32;H01L21/205;H01L21/3065;(IPC1-7):H05H1/00 |
主分类号 |
H05H1/46 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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