发明名称 Angle of incidence accuracy in ultrathin dielectric layer ellipsometry measurement
摘要 Improvements in accuracy and sensitivity in mechanical-optical metrology apparatus are achieved through the use of a value for angle of incidence that is an average of positive and negative values for different arrangements of the metrology apparatus. In the ellipsometry type of metrology the average value for angle of incidence is established by using one of a reversal of light beam direction, the providing of a separate light beam mounting arm and the mechanical rotation of the sample.
申请公布号 US6323947(B1) 申请公布日期 2001.11.27
申请号 US19990461658 申请日期 1999.12.14
申请人 INTERFACE STUDIES CORPORATION 发明人 FREEOUF JOHN LAWRENCE
分类号 G01N21/21;(IPC1-7):G01J4/00 主分类号 G01N21/21
代理机构 代理人
主权项
地址