| 摘要 |
PROBLEM TO BE SOLVED: To improve the uniformity of prescribed treatment, such as cleaning treatment and etching treatment, to a substrate. SOLUTION: This device has a treating vessel 1 which cleans a wafer W, a treating liquid supplying section 3 which supplies a treating liquid to the treating vessel 1, a treating liquid forming section 6 which communicates with the treating liquid supplying section 3 and forms the treating liquid, a medicinal liquid tank 9 which communicates with the treating liquid forming section 6 across piping 7 for the medicinal liquid, a first pure water supplying source 21 which communicates with the treating liquid forming section 6 across piping 21 for first pure water, a second pure water supplying source 31 which communicates with the piping 20 for the first pure water across piping 30 for second pure water of the temperature higher than the first temperature, a medicinal liquid supplying valve 15 which regulates the supplying rate of the medicinal liquid, a second pure water supplying valve 34 which regulates the supplying rate of the second pure water and a control section 50 which controls the medicinal liquid supplying valve 15 and a second pure water supplying valve 34 so as to form the treating liquid by the medicinal liquid and the second pure water in the treating liquid forming section 6.
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