| 摘要 |
PROBLEM TO BE SOLVED: To provide a copper(I) beta-diketonate complex for forming a copper thin film through metal organics chemical vapor deposition(MOCVD) and its production method. SOLUTION: The copper(I) beta-diketonate complex represented by general formula (2) (R6 and R7 are each same or different and a linear or branched 1-4C alkyl, a 1-4C alkoxy or a linear or branched fluorine-substituted 1-4C alkyl; R8 is a hydrogen atom or a fluorine atom) having an allene compound represented by general formula (1) [R1-R4 are each same or different and a hydrogen atom, a 1-4C alkyl or (R5)3Si; R1 and R2 may form a 3-6 membered ring; R2 and R3 may form a 8-10 membered ring; R5 is one or more kinds of a linear or branched 1-4C alkyl] and its production method are disclosed. Formula (3) (L is 1,2-cyclononadiene) is exemplified.
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