发明名称 |
NEW POLYCYCLIC UNSATURATED HYDROCARBON DERIVATIVE AND METHOD FOR PRODUCING THE SAME |
摘要 |
PROBLEM TO BE SOLVED: To provide a new polycyclic unsaturated hydrocarbon derivative useful as a monomer for producing radiation-sensitive resists which have good dry etching resistance and excellent transparency for radiations having wavelengths of <=160 nm. SOLUTION: This polycyclic unsaturated hydrocarbon derivative represented by the general formula [X is an acid-dissociating dissolution-inhibiting group; Y is an electron-attracting group; (m) is 0 or 1]. |
申请公布号 |
JP2001328964(A) |
申请公布日期 |
2001.11.27 |
申请号 |
JP20000148976 |
申请日期 |
2000.05.19 |
申请人 |
TOKYO OHKA KOGYO CO LTD |
发明人 |
OGATA TOSHIYUKI |
分类号 |
G03F7/039;C07C67/343;C07C67/475;C07C69/753;C07D307/20;C07D307/60;C07D309/12;C08F32/00;C08G61/08 |
主分类号 |
G03F7/039 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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