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发明名称
Plasma vapour-deposition apparatus
摘要
申请公布号
EP0575055(B1)
申请公布日期
2001.11.21
申请号
EP19930303925
申请日期
1993.05.20
申请人
MURAYAMA, YOICHI;SHINCRON CO., LTD.;C. ITOH FINE CHEMICAL CO. LTD.
发明人
MURAYAMA, YOICHI;NARITA, TOSHIO
分类号
C23C14/04;C03C17/245;C23C14/32;C23C14/24;C23C14/56;(IPC1-7):C23C14/56;C23C14/08
主分类号
C23C14/04
代理机构
代理人
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地址
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