| 摘要 |
PROBLEM TO BE SOLVED: To provide a rotary coating method which prevents the contamination of the back of a square substrate caused by the adhesion of a coating solution to the back when the solution is applied on the substrate, eliminates a back treatment process after a coating process, and enables the simplification of coating, and also provide an apparatus for the method. SOLUTION: In the rotary coating method in which the coating solution 10 is dropped in the middle of the surface of the square substrate 1 fixed to a specimen table 2, and the film of the solution 10 is formed on the surface of the substrate 1 by centrifugal force generated by the rotation of the table 2, the table 2 is formed by a disk-shaped member 2a formed in the shape of a disk the diameter of which is larger than the length of the diagonal line of the substrate 1 and a rectangular substrate contact part 2b contacting the substrate 1, the splash 12 of the excess portion of the solution 10 scattering from the peripheral end part of the substrate is caught by the member 2a, and the adhesion of the splash of the coating solution to the side part and the back of the substrate is prevented, so that the contamination of the back of the substrate is prevented. |
