Photonic bandgap materials based on germanium

摘要

Photonic bandgap materials based on germanium and methods of synthesis of germanium based photonic band gap (PBG) materials. The synthesis and characterization of high quality, very large scale, face centered cubic photonic band gap (PBG) materials consisting of pure germanium, exhibiting three-dimensional PBGs in the near infrared region. This is obtained by two different methods: (1) infiltrating a self-assembling silica opal template with a germanium alkoxide which is later hydrolyzed to form germanium(IV) oxide. This compound is then reduced to germanium(0) in a hydrogen atmosphere. This cycle is repeated until the desired germanium infiltration is attained. Once the germanium guest lattice is formed, the template is removed and a germanium inverse opal is obtained. (2) Chemical vapor deposition of germanium into a self-assembling silica opal template, and subsequent removal of the template. This achievement realizes a long standing goal in photonic materials and opens a new door for complete control of radiative emission from atoms and molecules, light localization and the integration of micron scale photonic devices into a three-dimensional all-optical micro-chip.