发明名称 Method of manufacturing member for thin-film formation apparatus and the member for the apparatus
摘要 A technique to prevent peeling of deposits formed on the surface of the inner walls of the thin-film formation apparatus and the members inside the apparatus and to suppress particle production without contamination of the inside of the apparatus. A member for a thin-film formation apparatus having inner walls and a method for manufacturing the member is provided. A plurality of unevenness is provided on at least a portion of the surface of the member and the inner walls on which unnecessary thin films are deposited. The surfaces are subjected to masking, and then, etching processing to form the plurality of unevenness. After the etching processing the masking is removed.
申请公布号 US6319419(B1) 申请公布日期 2001.11.20
申请号 US19990439139 申请日期 1999.11.12
申请人 JAPAN ENERGY CORPORATION 发明人 OHHASHI TATEO;FUKUSHIMA ATSUSHI;TAKAHASHI HIDEYUKI
分类号 C23C14/00;C23C14/56;C23C16/44;C23F4/00;H01L21/205;(IPC1-7):B31D3/00 主分类号 C23C14/00
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