发明名称 System and method for performing low contamination extrusion for microelectronics applications
摘要 This invention relates to a system and method for performing accurate coating operations while minimizing contamination of the coating fluid arising from contact between the fluid and the extrusion head. In one embodiment, the extrusion head is composed entirely of non-metallic material, possibly ceramic, thereby minimizing any material removal by the fluid, and any ionic or chemical reaction between the extrusion head material and the fluid. In another embodiment, a shim separating metal parts of an extrusion head is composed of a non-metallic substance to prevent galvanic potential induced corrosion between the shim and the extrusion head material and the resulting release of the products of such corrosion into the coating fluid.
申请公布号 US6319316(B1) 申请公布日期 2001.11.20
申请号 US19990251646 申请日期 1999.02.17
申请人 FASTAR, LTD. 发明人 GIBSON GREGORY M.;SOLIZ RENE;RAMON C. MATTHEW
分类号 B05C5/02;G03F7/16;G03F7/30;H01L21/00;(IPC1-7):B05C5/00 主分类号 B05C5/02
代理机构 代理人
主权项
地址