发明名称 Barium doping of molten silicon for use in crystal growing process
摘要 A process for preparing doped molten silicon for use in a single silicon crystal growing process is disclosed. Polysilicon is doped with barium and melted in a silica crucible containing less than about 0.5% gases insoluble in silicon. During melting and throughout the crystal growing process the barium acts as a devitrification promoter and creates a layer of devitrified silica on the inside crucible surface in contact with the melt resulting in a lower level of contaminants in the melt and grown crystal.
申请公布号 US6319313(B1) 申请公布日期 2001.11.20
申请号 US20000521288 申请日期 2000.03.08
申请人 MEMC ELECTRONIC MATERIALS, INC. 发明人 PHILLIPS RICHARD JOSEPH;KELTNER STEVEN JACK;HOLDER JOHN DAVIS;DRAFALL LARRY E
分类号 C30B29/06;C30B15/00;C30B15/10;(IPC1-7):C30B15/04 主分类号 C30B29/06
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