发明名称 STRUCTURE OF MAGNETO RESISTANCE(MR) ELEMENT AND ITS MANUFACTURING METHOD
摘要 PROBLEM TO BE SOLVED: To form an element wherein magnetic induction phase (PMR) effect or tunnel magneto resistance(TMR) effect are largely exhibited by precisely controlling thickness of a phase transformation layer or a cluster electrode and selecting materials properly. SOLUTION: An element constituted of the phase transformation layer (H component), a perpendicularly magnetized layer or a perpendicularly magnetized electrode and a strain-applied layer (J component) or an element constituted of a cluster layer (K component) is formed on an upper surface of an insulating substrate (B component) constituted of a nonmagnetic member by combining an MBE method, a lithography method, an intensive external magnetic field and heat treatment. As a result, a magneto resistance element or a spin- dependent tunnel magneto resistance element wherein magneto resistance(MR) is greatly reduced by applying a small external magnetic field is formed.
申请公布号 JP2001320109(A) 申请公布日期 2001.11.16
申请号 JP20010051464 申请日期 2001.02.27
申请人 KAWABATA TAKESHI 发明人 KAWABATA TAKESHI
分类号 G01R33/09;G11B5/39;H01F10/16;H01F41/18;H01L43/08;H01L43/12;(IPC1-7):H01L43/08 主分类号 G01R33/09
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