| 摘要 |
PROBLEM TO BE SOLVED: To provide an apparatus for feeding a liquid raw material for CVD which can feed a source gas for a long time continuously while preventing the source gas from reprecipitation. SOLUTION: The apparatus for feeding a liquid raw material for CVD comprises a vaporizer for vaporizing the liquid raw material fed by a liquid raw material feeding apparatus 30, which comprises a capillary 31a inside of which the liquid raw material is fed, a capillary insert part 31 in which the capillary 31a is inserted, a cooling gas feeding part 32 provided around the perimeter of the capillary insert part 31, and a carrier gas feeding part 33 provided around the perimeter of the cooling gas feeding part 32, and is characterized in that the capillary 31a is inserted to the capillary insert part 31 so as to be attachment/detachment convertible, and that its edge 31c juts to the vaporizer side more than the edge 32a of the cooling gas feeding part 32 and the edge 33a of the carrier gas feeding part 33 do.
|
