发明名称 FILM DEPOSITION SYSTEM, AND DEPOSITION SHIELD MEMBER USED FOR FILM DEPOSITION SYSTEM
摘要 PROBLEM TO BE SOLVED: To provide a film deposition system having deposition shield members capable of preventing the deposition of film onto the surface of substrate carriers and enabling easy maintenance at low cost. SOLUTION: The film deposition system 1 has substrate carriers 10 for holding and transferring substrates, and film deposition is carried out by depositing vapor deposition particles onto the substrates mounted on the substrate carriers 10. Detachable deposition shield members 11a to 11c for preventing the deposition of film onto the surface of the substrate carriers 10 are attached to respective bottom faces of the substrate carriers 10.
申请公布号 JP2001316797(A) 申请公布日期 2001.11.16
申请号 JP20000134538 申请日期 2000.05.08
申请人 MITSUBISHI ELECTRIC CORP 发明人 KAWAKUSU HIDE
分类号 B05B15/04;C23C14/00;C23C16/44;H01L21/203;H01L21/205;(IPC1-7):C23C14/00 主分类号 B05B15/04
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