METHOD AND APPARATUS FOR FORMING FILM, SILICON-BASED FILM, ELECTROMOTIVE FORCE ELEMENT AND SOLAR BATTERY THEREWITH, AND SENSOR AND IMAGING ELEMENT

摘要

PROBLEM TO BE SOLVED: To provide a method for forming a film such as a silicon-based film which can form a film having a good quality and adhesiveness even in a high film-formation speed. SOLUTION: The method of forming a film on a substrate 204 by a plasma- CVD method with high frequency is characterized by forming a film by providing a resistance constituent 603 consisting of different material from the above substrate, on an electricity path between the substrate 204 and an earth.