| 摘要 |
PROBLEM TO BE SOLVED: To provide a coating apparatus capable of forming a thin film with a definite film thickness by simple constitution and control. SOLUTION: After the inner gas in a vacuum chamber 1 is exhausted by a vacuum pump 8, an atmospheric gas 17 is introduced and the degree of vacuum in a vacuum chamber 1 is measured by a vacuum gage 9. The degree of vacuum in the vacuum chamber 1 is controlled to display a constant value comparing with the set value of the degree of vacuum in a valve controller 16. Thus, the deposition rate of a thin film 4 on a sample 5 is determined depending on the kind of atmospheric gas 17, its pressure and the applied voltage between a cathode 3 and an anode 6. When a timer 13 is set according to this deposition rate and the timer 13 starts at the same time when the voltage between electrodes is applied, a supply voltage to electrodes is disconnected by a contact 12 after the set time and the coating with a required film thickness can be carried out.
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