| 摘要 |
PROBLEM TO BE SOLVED: To provide a coating/developing process system in which the atmosphere in the route for a pre-exposure substrate and that in the route for a post-exposure substrate in an interface unit can be individually controlled. SOLUTION: In the interface unit of a coating/developing process system 1, a partitioning plate 42 is arranged, and a first gas-feed device 80 is arranged on the upper part of a region S1 for pre-exposure substrates, while a second gas-feed device 81 is arranged on the upper part of a region S2 for post- exposure substrates. The first gas-feed device 80 supplies a room-temperature inert gas that does not contain impurities such as oxygen or basic substances or particles, while the second gas-feed device 81 supplies an inert gas of a temperature lower than the room temperature. The region S1 for pre-exposure substrates is kept in a clean atmospheric condition, while the region S2 for post-exposure substrates is kept in a clean and low-temperature atmospheric condition. |
