| 摘要 |
<p>PROBLEM TO BE SOLVED: To equalize the exposure quantity on overlapped peripheries of shot regions to that on other regions than the overlapped parts in exposing the overlapped peripheries of the sot regions. SOLUTION: The exposing method with the exposure quantity gradually decreasing on overlapped peripheries of a plurality of regions for transferring patterns respectively to the regions, comprises a step of exposing one shot region on a substrate through a density filter set so as to form a first specified distribution of the energy quantity over the peripheries (SA6), measuring the exposure quantity distribution over parts corresponding to the peripheries on the substrate (SA7), determining a second distribution where the exposure quantity on the peripheries is a target value based on the measured exposure quantity distribution (SA8), and exposing a shot region adjacent to the one shot region through a gray filter set so as to provide the second distribution (SA9, SA10).</p> |
