发明名称 |
SPUTTERING TARGET FOR FORMATION OF OPTICAL LOGGING PROTECTION FILM CAPABLE OF DC SPUTTERING |
摘要 |
PROBLEM TO BE SOLVED: To provide a sputtering target for formation of an optical logging protection film which is made of zinc chalcogenide/silicon dioxide/indium oxide- based sintered compact and is capable of DC sputtering. SOLUTION: This sputtering target comprises 10-30 mol% silicon dioxide, 0.5-30 mol% indium oxide and the balance zinc chalcogenide. |
申请公布号 |
JP2001316805(A) |
申请公布日期 |
2001.11.16 |
申请号 |
JP20000134383 |
申请日期 |
2000.05.08 |
申请人 |
MITSUBISHI MATERIALS CORP |
发明人 |
ODA JUNICHI;KYO JINKO |
分类号 |
C04B35/547;C23C14/34;G11B7/26 |
主分类号 |
C04B35/547 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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