POSITIVE TYPE RADIATION SENSITIVE COMPOSITION

摘要

PROBLEM TO BE SOLVED: To provide a positive type radiation sensitive composition used as a positive type chemical amplification resist and having such high process admissibility as to ensure excellent resolving power and pattern profile even if considerable time elapses from the end of exposure to post-heating. SOLUTION: The positive type radiation sensitive composition contains a resin having its solubility in an alkali developing solution increased by the action of an acid, a compound which generates the carboxylic acid having a molecular weight of <=100 when irradiated with active light or radiation, a surfactant and a solvent.