发明名称 DETECTION SYSTEM OF PARTICLE BEAM APPARATUS AND PARTICLE BEAM APPARATUS EQUIPPED WITH THIS KIND OF DETECTION SYSTEM
摘要 <p>PROBLEM TO BE SOLVED: To propose a detection system, particularly for particle beam apparatus, that has made the detection system available even when differences between primary, secondary and back-scattered particles are very small and that can preferentially detect secondary particles emitted from an object or particles backwardly scattered by the object. SOLUTION: Provided on a target structure 5 are paraxial median regions (6, 23, 29) that are received in regions (7, 24, 28) far from the axial line made of materials intensively converting electrons, and adjacent to the light axis (25) of the particle beam apparatus.</p>
申请公布号 JP2001319613(A) 申请公布日期 2001.11.16
申请号 JP20010071757 申请日期 2001.03.14
申请人 LEO ELEKTRONENMIKROSKOPIE GMBH 发明人 DREXEL VOLKER;BIHR JOHANNES;BENNER GERD DR;KUJAWA STEPHAN
分类号 G01N23/225;G21K1/08;G21K5/04;H01J37/05;H01J37/244;H01J37/28;(IPC1-7):H01J37/244 主分类号 G01N23/225
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