| 摘要 |
PROBLEM TO BE SOLVED: To provide an exposing method, an aligner, and a device manufacturing method which can obtain good resolution in multiple exposure, especially, expand the focusing depth according to a pattern intended for the resolution and required depth, and reduce the influence of the astigmatism on the image to obtain a good resolution even in a process with a small factor k1. SOLUTION: In the method of multiply exposing, including a first and second exposures of a first and second patterns to expose a desired pattern, using a projection optical system, the number of apertures (NA1) of the projection optical system in the exposure of the first pattern is made different from the number of apertures (NA2) of the projection optical system in the exposure of the second pattern. |
