发明名称 SEMICONDUCTOR DEVICE AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICES
摘要 A method for manufacturing a semiconductor device that fills contact holes with conductive material such as aluminum or an aluminum alloy. A semiconductor device is manufactured by the process of forming an opening such as a contact hole in an interlayer dielectric film formed on a semiconductor substrate having a device element formed thereon. A first film and a second film made of conductive material such as aluminum or an alloy containing aluminum are formed on the interlayer dielectric film and the opening. The second film is then gradually cooled.
申请公布号 US2001041440(A1) 申请公布日期 2001.11.15
申请号 US19990389515 申请日期 1999.09.03
申请人 ENDO MAMORU;TAKEUCHI JUNICHI;ASAHINA MICHIO;SUZUKI EIJI;MATSUMOTO KAZUKI 发明人 ENDO MAMORU;TAKEUCHI JUNICHI;ASAHINA MICHIO;SUZUKI EIJI;MATSUMOTO KAZUKI
分类号 H01L21/28;H01L21/285;H01L21/768;(IPC1-7):H01L21/476;H01L21/44 主分类号 H01L21/28
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