发明名称 |
Epitaxial silicon wafers substantially free of grown-in defects |
摘要 |
The present invention is directed to a set of epitaxial silicon wafers assembled in a wafer cassette, boat or other wafer carrier. Each wafer comprises a single crystal silicon substrate having an axially symmetric region in which silicon self-interstitials are the predominant intrinsic point defect and which is substantially free of agglomerated defects, and an epitaxial layer which is deposited upon a surface of the substrate and which is substantially free of grown-in defects caused by the presence of agglomerated silicon self-interstitial defects on the substrate surface upon which the epitaxial layer is deposited.
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申请公布号 |
US2001039916(A1) |
申请公布日期 |
2001.11.15 |
申请号 |
US20010874487 |
申请日期 |
2001.06.05 |
申请人 |
MULE' STAGNO LUCIANO;FEI LU;HOLZER JOSEPH C.;KORB HAROLD W.;FALSTER FALSTER J. |
发明人 |
MULE' STAGNO LUCIANO;FEI LU;HOLZER JOSEPH C.;KORB HAROLD W.;FALSTER FALSTER J. |
分类号 |
C30B29/06;C30B15/00;C30B15/20;H01L21/208;H01L21/322;(IPC1-7):C30B15/00;C30B21/06;C30B27/02;C30B28/10;C30B30/04 |
主分类号 |
C30B29/06 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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