| 摘要 |
An electrostatic chuck allowing the temperature of a ceramic substrate to be raised and lowered at a sufficiently high rate even if the diameter of the ceramic substrate exceeds 190 mm, particularly, even if the size of the ceramic substrate is increased such that the diameter thereof is equal to or more than 300 mm, wherein a temperature control means is provided on the ceramic substrate, an electrostatic electrode is formed on the ceramic substrate, and a ceramic dielectric film is applied onto the electrostatic electrode, characterized in that the diameter of the ceramic substrate exceeds 190 mm, the thickness thereof is 20 mm or thinner, and the ceramic dielectric film contains 0.1 to 20 wt% of oxygen.
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