发明名称 PHOTOPOLYMERIZABLE RESIN COMPOSITION AND USE THEREOF
摘要 <p>This invention relates to a photopolymerizable resin composition containing resin component (A) composed of a resin and/or a resin-forming ingredient and a photopolymerization initiator (B) wherein the component (A) comprises an addition-polymerizable compound (A1) having at least two ethylenically unsaturated groups and the photopolymerization initiator (B) comprises a diaminobenzophenone compound (B1), an N-phenylglycine compound (B2), and at least one kind of compound selected from a group of a 3,3',4,4'-tetra (alkylperoxycarbonyl) benzophenone (B3), 2-methyl-1-Ä4-(thiomethyl)phenylÜ-2-morpholinopropan-1-one (B4), and a 1,3,5-triazine derivative (B5) containing at least one trihalomethyl group as substituent.A photopolymerizable resin composition of this invention excels in resolution, adhesion of patterns, development latitude, and curing on the surface and inside and can be used advantageously in insulating films, colored films, inks for color filters, resists for semiconductors, and insulating spacers for touch panels.</p>
申请公布号 EP1153935(A1) 申请公布日期 2001.11.14
申请号 EP19990923963 申请日期 1999.06.08
申请人 NIPPON STEEL CHEMICAL CO., LTD. 发明人 FUJISHIRO, KOICHI;HIGASHI, MANABU
分类号 G03F7/028;C08F2/48;C08F2/50;C08F20/10;C08F290/06;C08K5/17;C08L57/00;C08L101/14;C09D4/02;G02B5/22;G03F7/00;G03F7/031;(IPC1-7):C08F2/48;C09D4/00;G02B5/20;G03F7/004 主分类号 G03F7/028
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