| 发明名称 |
Method for applying a barrier layer to a silicon based substrate and an article prepared in accordance with the method |
| 摘要 |
<p>A method for applying a barrier layer which comprises a barium-strontium aluminosilicate to a silicon containing substrate which inhibits the formation of cracks.</p> |
| 申请公布号 |
EP1044947(A3) |
申请公布日期 |
2001.11.14 |
| 申请号 |
EP20000108347 |
申请日期 |
2000.04.14 |
| 申请人 |
UNITED TECHNOLOGIES CORPORATION |
发明人 |
EATON, HARRY E.;LAWTON, THOMAS H. |
| 分类号 |
B05D3/02;B05D7/14;B05D7/24;B32B37/00;C04B41/50;C04B41/52;C04B41/85;C04B41/87;C04B41/89;C23C4/02;C23C4/06;C23C4/10;C23C4/18;C23C28/00;C23C28/04;F01D5/28;(IPC1-7):C04B41/87 |
主分类号 |
B05D3/02 |
| 代理机构 |
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代理人 |
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| 主权项 |
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| 地址 |
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