| 发明名称 |
COMPOSITION FOR ANTIREFLECTION COATING |
| 摘要 |
<p>A resist pattern having a good form without any T-top or round top is obtained by coating on a photoresist layer an anti-reflective coating composition containing at least (a) polyacrylic acid, (b) polyvinyl pyrrolidone, (c) CnF2n+1COOOH (wherein n represents an integer of 3 to 11) and (d) tetramethylammonium hydroxide to form an anti-reflective coating, and conducting patternwise exposure and development.</p> |
| 申请公布号 |
EP1154324(A1) |
申请公布日期 |
2001.11.14 |
| 申请号 |
EP20000974831 |
申请日期 |
2000.11.08 |
| 申请人 |
CLARIANT INTERNATIONAL LTD. |
发明人 |
TAKANO, YUSUKE;TANAKA, HATSUYUKI;LEE, DONG HAN |
| 分类号 |
G03F7/09;H01L21/027;C08L33/02;G03F7/11;(IPC1-7):G03F7/11 |
主分类号 |
G03F7/09 |
| 代理机构 |
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