Method of manufacturing thin-film magnetic head and method of manufacturing magnetoresistive device

摘要

A thin-film magnetic head comprises a reproducing head and a recording head. The reproducing head includes: a GMR element; a bottom shield layer and a top shield layer for shielding the GMR element; a conductive layer connected to the GMR element; and first to fourth shield gap films placed between the shield layers. A plurality of layers making up the GMR element are formed on the first shield gap film. Reactive ion etching is performed to etch a part of the thickness of these layers. Ion milling is then performed to etch the remaining part. The GMR element is thus formed. The second shield gap film is formed around the GMR element on the first shield gap film.