发明名称 |
High-temperature fluorinated chemistry removal of contact BARC layer |
摘要 |
An anti-reflective coating layer which is used to provide better control over the photolithographic process during the contact masking step is removed using high-temperature fluorine containing chemistry to reduce the amount of thickness variations that remain after the metal contact is filled in the contact hole and planarized by polishing. As a result, post-polish defect inspections are facilitated.
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申请公布号 |
US6316345(B1) |
申请公布日期 |
2001.11.13 |
申请号 |
US19990369602 |
申请日期 |
1999.08.06 |
申请人 |
ADVANCED MICRO DEVICES, INC. |
发明人 |
SHIELDS JEFFREY A. |
分类号 |
H01L21/311;H01L21/768;(IPC1-7):H01L21/44 |
主分类号 |
H01L21/311 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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