发明名称 |
Method for removing extraneous matter by using fluorine-containing solution |
摘要 |
A method for removing extraneous matters from a stainless device is provided. The method includes the steps of (a) providing a container for holding a fluorine-containing neutral solution therein, (b) immersing said stainless device in said fluorine-containing neutral solution to remove said extraneous matters from said stainless device, and (c) heating and swirling said fluorine-containing solution. The fluorine-containing neutral solution is made from neutralizing hydrofluoric acid (HF) with ammonium hydroxide (NH4OH), neutralizing hydrofluoric acid (HF) with ammonium fluoride (NH4F), or dissolving ammonium acid fluoride (NH4F) in a deionized water (DIW).
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申请公布号 |
US6315834(B1) |
申请公布日期 |
2001.11.13 |
申请号 |
US19990427201 |
申请日期 |
1999.10.25 |
申请人 |
UTEK SEMICONDUCTOR CORP.;UNITED MICROELECTRONICS CORP. |
发明人 |
CHUNG PING-CHUNG;LU TSUNG-LIN;CHUNG HUNTER;CHEN CHIN-HSIEN;CHEN WENG-YI;YAO JACK;CHEN CHIENFENG |
分类号 |
C23C16/44;C23G1/24;(IPC1-7):C03C23/00 |
主分类号 |
C23C16/44 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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