发明名称 Method for removing extraneous matter by using fluorine-containing solution
摘要 A method for removing extraneous matters from a stainless device is provided. The method includes the steps of (a) providing a container for holding a fluorine-containing neutral solution therein, (b) immersing said stainless device in said fluorine-containing neutral solution to remove said extraneous matters from said stainless device, and (c) heating and swirling said fluorine-containing solution. The fluorine-containing neutral solution is made from neutralizing hydrofluoric acid (HF) with ammonium hydroxide (NH4OH), neutralizing hydrofluoric acid (HF) with ammonium fluoride (NH4F), or dissolving ammonium acid fluoride (NH4F) in a deionized water (DIW).
申请公布号 US6315834(B1) 申请公布日期 2001.11.13
申请号 US19990427201 申请日期 1999.10.25
申请人 UTEK SEMICONDUCTOR CORP.;UNITED MICROELECTRONICS CORP. 发明人 CHUNG PING-CHUNG;LU TSUNG-LIN;CHUNG HUNTER;CHEN CHIN-HSIEN;CHEN WENG-YI;YAO JACK;CHEN CHIENFENG
分类号 C23C16/44;C23G1/24;(IPC1-7):C03C23/00 主分类号 C23C16/44
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