发明名称 |
REFLECTION PREVENTING BASE MATERIAL |
摘要 |
PROBLEM TO BE SOLVED: To provide a reflection preventing base material provided with a reflection preventing layer having sufficient scratch resistance and hard to easily peel. SOLUTION: The reflection preventing base material is constituted by laminating a high refractive index layer formed by curing a coating film comprising a composition of a component (A): a compound having two or more unsaturated double bonds and polymerizable by the irradiation with active energy rays or an oligomer thereof, a component (B): an organosilicon compound a polymer thereof or hydrolysate thereof, and a component (C): particles of at least one metal oxide selected from zirconium oxide, titanium oxide, tin oxide and antimony oxide; and a low refractive index layer comprising cured matter of an organosilicon compound on the surface of a base material in this order. |
申请公布号 |
JP2001315242(A) |
申请公布日期 |
2001.11.13 |
申请号 |
JP20000139822 |
申请日期 |
2000.05.12 |
申请人 |
SUMITOMO CHEM CO LTD;SUMITOMO OSAKA CEMENT CO LTD |
发明人 |
MUTO KIYOSHI;AKATA KATSUMI;TAKAHASHI KENJI;KATOU HIROTSUGU |
分类号 |
G02B1/11;B32B7/02;G02B1/10 |
主分类号 |
G02B1/11 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|