发明名称 REFLECTION PREVENTING BASE MATERIAL
摘要 PROBLEM TO BE SOLVED: To provide a reflection preventing base material provided with a reflection preventing layer having sufficient scratch resistance and hard to easily peel. SOLUTION: The reflection preventing base material is constituted by laminating a high refractive index layer formed by curing a coating film comprising a composition of a component (A): a compound having two or more unsaturated double bonds and polymerizable by the irradiation with active energy rays or an oligomer thereof, a component (B): an organosilicon compound a polymer thereof or hydrolysate thereof, and a component (C): particles of at least one metal oxide selected from zirconium oxide, titanium oxide, tin oxide and antimony oxide; and a low refractive index layer comprising cured matter of an organosilicon compound on the surface of a base material in this order.
申请公布号 JP2001315242(A) 申请公布日期 2001.11.13
申请号 JP20000139822 申请日期 2000.05.12
申请人 SUMITOMO CHEM CO LTD;SUMITOMO OSAKA CEMENT CO LTD 发明人 MUTO KIYOSHI;AKATA KATSUMI;TAKAHASHI KENJI;KATOU HIROTSUGU
分类号 G02B1/11;B32B7/02;G02B1/10 主分类号 G02B1/11
代理机构 代理人
主权项
地址