发明名称 METHOD FOR PRODUCING PARTIALLY PROTECTED POLYHYDROXYSTYRENE
摘要 PROBLEM TO BE SOLVED: To provide a method for producing a partially protected polyhydroxystyrene which has the hyroxy groups partially protected with a tertiary alkyl group or a tertiary alkyl group and an acetal group. SOLUTION: The method for producing a partially protected polyhydroxystyrene is characterized in that a polymer having the repeated units originated from styrene having a tertiary alkoxy group as a substituent is treated with a deprotection reaction so that 80-95 mol% of the substituents may be converted to their hydroxyl groups; and that the partially protected polyhydroxystyrene thus obtained is further reacted with vinyl ether so that part of the hydoxy groups may be converted to their acetal groups.
申请公布号 JP2001316418(A) 申请公布日期 2001.11.13
申请号 JP20000138045 申请日期 2000.05.11
申请人 JSR CORP 发明人 YOKOYAMA KENICHI;MAEDA YUKIO;KOBAYASHI HIDEKAZU
分类号 G03F7/039;C08F8/12;C08F12/22;C08F212/14 主分类号 G03F7/039
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