发明名称 |
METHOD FOR PRODUCING PARTIALLY PROTECTED POLYHYDROXYSTYRENE |
摘要 |
PROBLEM TO BE SOLVED: To provide a method for producing a partially protected polyhydroxystyrene which has the hyroxy groups partially protected with a tertiary alkyl group or a tertiary alkyl group and an acetal group. SOLUTION: The method for producing a partially protected polyhydroxystyrene is characterized in that a polymer having the repeated units originated from styrene having a tertiary alkoxy group as a substituent is treated with a deprotection reaction so that 80-95 mol% of the substituents may be converted to their hydroxyl groups; and that the partially protected polyhydroxystyrene thus obtained is further reacted with vinyl ether so that part of the hydoxy groups may be converted to their acetal groups. |
申请公布号 |
JP2001316418(A) |
申请公布日期 |
2001.11.13 |
申请号 |
JP20000138045 |
申请日期 |
2000.05.11 |
申请人 |
JSR CORP |
发明人 |
YOKOYAMA KENICHI;MAEDA YUKIO;KOBAYASHI HIDEKAZU |
分类号 |
G03F7/039;C08F8/12;C08F12/22;C08F212/14 |
主分类号 |
G03F7/039 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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