发明名称 COPOLYMER AND COSMETIC MATERIAL CONTAINING IT
摘要 PROBLEM TO BE SOLVED: To provide a copolymer and/or a salt thereof which are water soluble and form a hydrophobic film after the application and to provide a cosmetic material which contains them and is useful for hair dressings. SOLUTION: The copolymer and/or the salt thereof, containing as the constituent monomers one or more kinds of monomers selected from the monomers expressed by formula (I) and one or more kinds of monomers selected from the monomers expressed by formula (II), are characterized in that they have cloudpoints; the cosmetic material such as that for the hair of the head is added therewith: formula (I) (wherein, R1 is a hydrogen atom or a 1-4C alkyl group; and R2 is a 4-30C hydrocarbyl group), formula (II) (wherein, R3 is a hydrogen atom or a 1-4C alkyl group; R4 is a 2-4C alkyl group which may contain an alkyloxy, acyloxy or hydroxyl group; R5 is a hydrogen atom, a 1-8C aromatic or aliphatic hydrocarbyl group or an acyl group; and n is a numerical value of 2-40).
申请公布号 JP2001316435(A) 申请公布日期 2001.11.13
申请号 JP20000135295 申请日期 2000.05.09
申请人 POLA CHEM IND INC 发明人 IYANAGI KOICHI
分类号 A61K8/63;A61K8/00;A61K8/90;A61K8/91;A61Q5/00;A61Q5/06;C08F220/26;C08F290/06;(IPC1-7):C08F290/06;A61K7/00;A61K7/06;A61K7/11 主分类号 A61K8/63
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